Lab Instruments

 

SEM/EDS

​Scanning Electron Microscope with Energy Dispersive X-ray Spectroscopy
Aspex Explorer

Remotely Accessible

Description: A focused beam of electrons to produces a high resolution image of a sample in the range of a few nanometers, as well as other signals containing topographical and compositional information.
Key Features: 2-25 kV e-beam, equipped with a secondary electron detector, quad back scatter electron detectors, x-ray detector, variable pressure mode allows imaging of some insulating samples.
Material Restrictions: Clean, dry, low-outgassing substrates, must be stable under mechanical vacuum, sputter coating of insulating samples may be necessary.
​General Information: A scanning electron microscope (SEM) is a high power microscope which utilizes a column of electrons to image a sample. Secondary and back-scattered electrons ejected by the sample are collected by a detector to form an image. Many SEM's are also able to determine the composition of a sample using an x-ray detector (EDS).​

 

Confocal Microscope

Laser Scanning Confocal Microscope
Olympius Fluoview FV10i

Remotely Accessible

Description: Solid-state laser diodes with four different excitation wavelengths are absorbed by the sample, and the resulting optical fluorescence is collected thru a confocal aperture by photomultiplier tubes.  As the lasers scans across the sample a fluorescent image is created.
Key Features: 450 nm, 535 nm, 570 nm, and 620 nm laser lines, equipped with a 10x and 60x oil-immersion objective lenses, photomultiplier tube fluorescent photon detectors, and a fully enclosed, vibration isolated bench-mount system. 2-D images, multiple Z-stack 3-D images, z-stack over time, and multiple-area imaging modes.
​Material Restrictions: Samples must fluoresce when excited by the laser wavelengths.  Samples must be mounted on standard 1 x 3 microscope slides with #1.5 coverslips.  Sample cells can be living or fixed.  Many natural materials autofluoresce, while others will require a fluorescent stain that can highlight specific cell structures.
​General Information: A laser scanning confocal microscope is primarily used to image biological samples. A laser irradiates the sample, and the resulting fluorescent photons are collected to from an image. Confocal microscopes can take image "slices" which can be stitched together to make a 3D picture.​

 

Profilometer

​Surface Contact Profilometer
Bunker DektakXT

Remotely Accessible

Description: Surface contact profilometer equipped with a 2.0 µm radius stylus.  The stylus runs over the sample, and is deflected by height changes in the sample surface topology.  An electronic capacitive sensing mechanism detects tip height changes.
Key Features: 2.0 µm diamond-tip stylus.  Z-Resolution as low as 5 Å, x-y scan sizes up to 55 mm x 55 mm.  Linear step height scans, and 3D stitching capability.  Equipped with a NIST-certified reference standard.
​Material Restrictions: Samples must be dry and locally flat to a couple of millimeters.  Sample stage is 22 cm x 22 cm.  Sample material must be mechanically robust to prevent the tip from scratching the sample surface.
​General Information: A profilometer is primarily used to measure step heights in the micron and nanometer size range. A stylus is moved over the sample. As it traces across the surface, the movement up and down is recorded as height.

 

AFM

Atomic Force Microscope
NanoSurf EasyScan 2

Remotely Accessible

Description: Used to characterize topographical and material properties using a cantilever and measuring its deflection with a laser while scanning over the sample surface in one of several modes.
Key Features: High resolution 3D topographical imaging w/ a range of 70 μm-xy, Z 14 μm-z and resolution of 1.1 nm-xy, 0.21 nm-z.
Modes: Contact modes: Static Force, Constant Force, Constant Height; Tapping Modes: Contrast Dynamic Force, Constant Amplitude, Constant Frequency, Phase Contrast.
​Materials Restrictions: Samples must be locally flat to within 500 nm and must fit on a standard 12.7 mm AFM puck.
​General Information: An atomic force microscope (AFM) can resolve features down to 1 nm or below. AFM's work by moving a tip across the surface of a sample and measuring the deflections of the tip though a feedback loop. The famous IBM Quantum Corral and the video A Boy and His Atom were created using an instrument similar to an AFM.

Metallographic Microscope

Metallographic Microscope
Reichert ​EpiStar 2560

Description: Used for IC inspection, examination of metallic grain structures, as well as studying composite materials.
Key Features: Magnification: 65x – 400x, Moticam 2000 2MP camera for image capture.
Materials Restrictions: Translucent and opaque specimens possible, specimen height less than 1 cm is necessary.
​General Information: A metallographic microscope is an optical microscope specifically designed for imaging metals. The microscope can illuminate the samples from above and collect the light reflected off the sample. This allows a metallographic microscope to image opaque samples such as metals, and microchips.

Dynamic Light Scattering
Malvern Zetasizer Nano ZS

Description: Used for particle/molecular size and zeta potential measurements of small or dilute samples, and samples at very low or high concentration.
Key Features: Particle/Molecular size measurement range: 0.3nm – 10.0 microns (diameter). Zeta Potential measurement range: 3.8nm – 100 microns (diameter).
Materials Restrictions: Minimum sample volume of 1mL for size measurements and 150 microliters for zeta potential measurements. Sample concentrations should be between 0.1ppm to 40%w/v.​
​General Information: DLS is used to measure particle and molecule size. This technique measures the diffusion of particles moving under Brownian motion, and converts this to size and size distribution using the Stokes-Einstein relationship.

Analytical Probe Station

Analytical Probe Station
Signatone S-1160

Description:  A multi-purpose analytical platform designed to support a broad range of precision probing applications, including RF probing, low current (femtoamp range) probing, failure analysis, thermal probing.
Key Features: Supports up to 6" wafers. Equipped with Motic Motic PSM-1000 Microscope. Magnification: 20-400x.
General Information: Probe stations are used to measure signals from a semiconductor device. Micropositioners are used for precise positioning of thin needles on the surface of the device. Probe stations are often used for testing new devices, quality control, and failure analysis.

Four Point Probe

Manual Four Point Resistivity Probe
Lucas Labs S-302-4 Resistivity Probe Stage

Description: Used to measure sheet resistivity on samples with flat surfaces. Utilizes four points probe head with superior accuracy compared to a two point probe test.
​Key Features: SP4 four point probe head, 4 inch Teflon isolation test disk.
Materials Restrictions: Sample must be flat to obtain accurate measurements and fit on 4 inch test disk.
​General Information: A four point probe stage is used to measure the sheet resistivity of thin films. Many thin films used in nanotechnology are highly conductive. Typical voltmeters will give an inaccurate resistance measurement for these types of films. Four point probes have separate terminals for voltage and current, and can give a more accurate resistance value.

Goniometer

Goniometer
AST Products VCA Optima

Description: Used to measure the contact angle of various liquids with a sample surface for surface energy analysis. Applications include evaluation of surface cleanliness, wetting behavior, bond quality, adhesion, absorption, surface treatments and coatings.
Key Features: Static contact angle analysis, motorized syringe for advancing and receding contact angle analysis, dynamic capture for high speed image capture, pendant drop analysis, and surface energy analysis.
​Materials Restrictions: Sample must be less than 8L x 8W x 8H cm.
​General Information: A contact angle goniometer is used to understand the interfacial properties of solid and liquid materials. Quantifiable information is obtained to build an understanding of trends seen with different surface coatings. The obtained contact angle also gives information that can be used to determine surface tension and surface energy of a material.

Solar Simulator

​Solar Simulator
Solar Light ​16S

Description: Used to accurately replicate full spectrum sunlight for the testing of photovoltaic cells, polymers, sun screens, and other materials and devices. 
Features: AM1.5G spectrum, typical spot size of 2.25 inch @ 1 sun output intensity, Class A spectrum solar simulator, and meets the latest ASTM standards.
​Materials Restrictions: Materials sensitive to UV degradation.
​General Information: A solar simulator has a high-powered lamp and filter system that outputs a spectrum of light which is close to the solar spectrum. Solar simulators are used to test solar cells.

Sputter Coater

Sputter Coater
Technics Hummer VI

Description: Deposits a conductive thin film coating. Sputter deposition is usually uniform and reproducible, yielding fine grain, adherent films. Used for SEM sample preparation. 
Key Features: Average deposition thickness of 300 Å Au, up to 9 samples at a time.
Materials Restrictions: Sample must be dry, and low outgassing substrates, and be stable under mechanical vacuum. Au and Au/Pd are available for deposition.
​General Information: A sputter coater is used to deposit a thin film of material on top of a sample. Gold and gold/palladium are commonly sputter coated materials. The material which coats the sample are placed in the sputter coater as "targets."

Carbon Coater

Carbon Coater
Cressington 108C

Description: Deposits a conductive thin film of carbon. Used for SEM and EDS sample preparation.
Key Features: Feedback-controlled rod evaporation system gives multiple evaporations of ~20nm thickness without need for rod shaping or adjustment. Ability to coat 12 SEM/EDS pin-mounted samples at a time. Fitted with a MTM-10 High Resolution Thickness Monitor. Resolution is better than 0.1nm for carbon and able to give 5% reproducibility of coating thickness in the 15-25nm range.
Materials Restrictions: Sample must be dry, and low outgassing substrates, and be stable under mechanical vacuum.
​General Information: A carbon coater is used to coat non-conductive specimens prior to SEM X-ray analysis. High purity stepped carbon rods are used to provide superior coating quality that is usable at high magnifications.

Vacuum Oven

Vacuum Oven
Fisher Scientific Isotemp 281A

Description: Used for the heat materials, to high temperatures in a vacuum to carry out processes such as brazing, sintering and heat treatment.
Key Features: 10 inches wide, 1000-watt wraparound element, inlet outlet valves for inert gas air replacement. Integrated mechanical vacuum pump capable of pressures below 500 mTorr.
​Materials Restrictions: Sample must fit in the internal dimensional limitation of 9.5W x 11D x 9.5H inches.
​General Information: Vacuum ovens are used to dry samples which contain water or other solvents before they are placed in a scanning electron microscope. If water is brought into the vacuum system of the SEM, it can harm the instrument. Samples are often pumped down under vacuum overnight. 

Sonicator
Branson 2510 Ultrasonic Cleaner

Description: Applies sonic vibrations to a sample in an ultrasonic bath in order to agitate particles in or on a sample, for various purposes such as lithography and sample cleaning.
Key Features: Sonicates at 40 kHz frequency, adjustable temperature from 20-60 ˚C, degasification, 99 min digital timer, 60 min mechanical timer and heat switch
​Materials Restrictions: Sample must within the dimensional limitation of the 9.5L x 5.5W x 4H inch tank.
​General Information: Sonicators are used to clean samples, and aid in mixing solutions. In the lithography process a sonicator is often used to assist with metal liftoff. Large sonicators are sometimes used in auto shops to clean car parts.

Spin Coater

​Spin Coater
ChemSols ​Spin Coater CSS-05

Description: A device used to apply uniform thin films to the surface of a flat substrate.
Key Features: Dual stage timer for separate spread and drawing steps, spread time 0-18 sec, dry time 0-60 sec, variable speed 600-1000 rpm.
​Materials Restrictions: Locally flat substrates less than 4 cm and larger than 1.5 cm in diameter.
​General Information: A spincoater is used to apply photoresist to wafers as part of the lithography process. A vacuum chuck is used to hold the wafer down as it spins. Typical spin speeds are between 1,000 and 5,000 rpm.

Laser Cutter

​Laser Cutter
Epilog Zing16

Description: A high powered laser cuts or engraves a sample.  Laser cutter can be used to make labels or cut out flat prototypes.
Key Features: 30 Watt CO2 laser and cutting table.  Vector cutting of acrylic up to 1/4 inch thick. Raster engraving mode. Equipped with HEPA filter unit and compressed air unit.
​Material Restrictions: Samples must be flat. Cutting stage is 16 in x 12 in.  Sample materials include acrylic, cardboard, paper, wood, and rubber. Will engrave anodized aluminum. Will not cut metals or ceramics. Halogenated plastics such as PVC are not allowed.
​​General Information: A laser cutter is used to cut thin sheets of plastic, wood, rubber, cardboard and paper. Most laser cutters can also raster engrave a pattern on the surface of a sample. Simple CO2 lasers are not powerful enough to cut through metals, glass, or ceramics.  

3D Printer

​3D Printer
MakerBot Industries Replicator2

Description: 3D extrusion printer.  Prints using PLA filament.
Key Features: Can print 3D objects up to 15 cm × 25 cm × 12 cm in size.
Materials Restrictions: PLA is the only printing material. The Replicator2 is not equipped to print ABS or other materials.
​General Information: 3-D printers produce three dimensional objects designed in CAD software. With a 3-D printer, it is possible to build parts for custom lab instruments and fittings. The popularity of 3-D printers is growing rapidly. They are part of the exciting field of additive manufacturing.

Nano Lab Links

Lab Instruments

Remote Access

Lab Access

​Continuing Ed SEM