A spincoater is used to apply photoresist to wafers as part of the lithography process.
A vacuum chuck is used to hold the wafer down as it spins.
Typical spin speeds are between 1,000 and 5,000 rpm.
For questions about the NSCC Nanotechnology program including courses and program options, please contact the SHINE Center Director at email@example.com
For questions about nanotechnology internships or careers in nanotechnology, please contact the SHINE Recruitment & Employment Specialist at firstname.lastname@example.org