A spincoater is used to apply photoresist to wafers as part of the lithography process.
A vacuum chuck is used to hold the wafer down as it spins.
Typical spin speeds are between 1,000 and 5,000 rpm.
For general inquiries, comments, and information, contact us at email@example.com
For questions about the NSC Nanotechnology lab, please contact the NSC Nanotechnology Lab Manager at firstname.lastname@example.org
For questions about the NSC Nanotechnology internship program, please contact the SHINE Employment & Internship Specialist at email@example.com